发明名称 CVD of conformal coatings over a depression using alkylmetal precursors
摘要 A CVD method for forming a conformal coating over a depression or a cave in a top surface is disclosed, which comprises the steps of forming at least one depression or a cave in said top surface where at least a portion of the depression or the cave has an inner surface; providing a reactive precursor containing at least an alkyl metal compound; and CVD forming from a gas of said reactive precursor at least one metal-containing layer over said top surface and said depression or cave such that the ratio ds/dt of the thickness (ds) of the layer on the inner surafce of the depression or cave and the thickness (dt) of the layer on the top surface is substantially one.
申请公布号 US5462767(A) 申请公布日期 1995.10.31
申请号 US19930139864 申请日期 1993.10.22
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI, SHUNPEI;INUJIMA, TAKASHI
分类号 C23C16/04;C23C16/48;H01L21/02;H01L21/268;(IPC1-7):C23C16/00;H01L21/306 主分类号 C23C16/04
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