| 摘要 |
PURPOSE:To form an optical thin film on a glass substrate without heating the glass substrate. CONSTITUTION:The optical parts has such a structure that the first layer from the substrate side is a silicon-base oxide layer having >=2nm optical film thickness and that at least one layer containing at least one of MoO3 and WO3 is included in the second and succeeding layers. Since MoO3 and WO3 have good adhesion property with silicone-base oxide, heating of the substrate for vapor deposition of MoO3 and WO3 is not needed. |
