发明名称 POSITIVE TYPE PHOTORESIST COMPOSITION
摘要 PURPOSE:To ensure high resolving power and to reduce the dependency of resolving power on film thickness by incorporating an alkali-soluble resin and 1,2-naphthoquinonediazido-5- (and/or -4-)sulfonic ester of a specified polyhydroxy compd. CONSTITUTION:An alkali-soluble resin and 1,2-naphthoquinonediazido-5(and/or -4-)sulfonic ester of a polyhydroxy compd. having a structure represented by the formula are incorporated. In the formula, each of R1-R3 is H, halogen, hydroxyl, alkyl or alkoxy and each of (m), (n) and (o) is an integer of 1-3. The alkali-soluble resin is, e.g. novolak resin, acetone-pyrogallol resin, polyhydroxystyrene or its deriv. and it is preferably novolak resin obtd. by bringing a prescribed monomer as a principal component into addition polymn. with aldehydes in the presence of an acidic catalyst.
申请公布号 JPH07281428(A) 申请公布日期 1995.10.27
申请号 JP19940069710 申请日期 1994.04.07
申请人 FUJI PHOTO FILM CO LTD 发明人 KAWABE YASUMASA;SATO KENICHIRO
分类号 G03F7/022;H01L21/027;(IPC1-7):G03F7/022 主分类号 G03F7/022
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