| 摘要 |
<p>PURPOSE:To provide such an adhesive film for protection of a photomask which shows no decrease in the antistatic effect or release effect even when the film is wiped with alcohol for cleaning or the humidity decreases, can be produced with good productivity without requiring a large-scale device for formation of thin films, and has good balance in performance as an adhesive film and excellent transparency. CONSTITUTION:This adhesive film for protection of a photomask is produced by applying an antistatic agent on the one surface of a polyethylene terephthalate film to form an antistatic layer in 1mum thickness, applying a release agent to 1mum thickness on the antistatic layer, and forming an acryl adhesive layer on the other surface of the film. The antistatic agent used consists of 200g aniline polymer, 200g pentaerythritol triacrylate, 200g 1,6-bis(3- acryloxy-2-hydroxypropyl)hexyl ether, 30g benzophenone and 10g Michiler's ketone.</p> |
