PROCESS AND DEVICE FOR CHEMICALLY TREATING SUBSTRATES

摘要

In a process and device for chemically treating substrates, at least one substrate is successively subjected to a chemical treatment, a rinsing process and a drying process. In order to rationalise the course of the process, in particular to reduce the space required and the contamination of the substrates, and finally to make it possible to dispense with substrate holding cassettes or the like, the chemical treatment and the rinsing process are carried out in the same basin.