A method and apparatus for cleaning a substrate in preparation for thin film coating. The invention involves cleaning the substrate in a cleaning chamber (40) under controlled conditions by a blast (12) of carbon dioxide pellets suspended in and transported by a compressed gas medium.
申请公布号
WO9528256(A1)
申请公布日期
1995.10.26
申请号
WO1995US04367
申请日期
1995.04.10
申请人
VIRATEC THIN FILMS, INC.
发明人
BJORNARD, ERIK, J.;KURMAN, ERIC, W.;SHOGREN, DAVID, A.;HOFFMAN, JEFFREY, J.
