| 发明名称 |
pH Adjusted nonionic surfactant containing alkaline cleaner composition for cleaning microelectronics substrates. |
| 摘要 |
<p>Aqueous alkaline cleaning solutions for cleaning microelectronic substrates and maintaining substrate surface smoothness comprise a metal ion free base, a nonionic surfactant and a component to reduce or control the pH of the cleaning solution to a pH within the range of from about pH 8 to about pH 10.</p> |
| 申请公布号 |
EP0678571(A2) |
申请公布日期 |
1995.10.25 |
| 申请号 |
EP19950105743 |
申请日期 |
1995.04.18 |
| 申请人 |
J.T. BAKER INC. |
发明人 |
ILARDI, JOSEPH M.;SCHWARTZKOPF, GEORGE,;DAILEY, GARY G. |
| 分类号 |
C11D10/02;C11D1/66;C11D3/02;C11D3/30;H01L21/304;H01L21/306;H01L21/308;(IPC1-7):C11D3/30;C11D1/72;C11D3/20;C11D1/74 |
主分类号 |
C11D10/02 |
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