| 摘要 |
PURPOSE:To provide an electrode plate for plasma etching and the producing method capable of stably etching with a high precision over a long time. CONSTITUTION:This electrode plate for plasma etching is a flat electrode made by drilling many narrow through-holes through a vitreous carbon plate and the narrow through-holes are formed at the time of molding a resin plate. The producing method is that a resin material prepared by adding and mixing a thermosetting resin fine powder which kind is same as that of the corresponding one of following resins into a liquid furan resin, a phenol resin or a mixed resin of them or these liquid resin, the resultant mixture is molded into a flat plate having a uniform thickness and hardened and the obtained resin plate, in which many narrow through-holes are previously drilled to expect dimensional shrinkage in carbonizing, is fired and carbonized in an inert gas atmosphere, if necessary, further graphitized and finally treated to attain high purity with a chlorine containing gas. |
