| 摘要 |
An exposure calculating apparatus includes a light-metering device, consisting of a light-metering elements corresponding to elementary areas obtained by dividing a field of a focusing optical system, for measuring a light intensity distribution in the field, a position of object detecting means for detecting a position of object in the field, a classifying means for changing a divisional pattern of light-metering areas in correspondence with the position of object, and classifying the light-metering elements of the light-metering device into a plurality of groups according to the divisional pattern, and a calculating device for calculating an exposure value by weighting the outputs from the plurality of light-metering elements in correspondence with the groups to which the light-metering elements belong, and supplying the exposure value to exposure control.
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