发明名称 |
Substrates treated with bis(hydroxyphenyl)sulfone stain-resists |
摘要 |
Polyamide fibrous substrates which resist staining by acid dyes and discoloration upon exposure to UV light, and processes for preparing the same which comprise applying, at pH 2 to 10, a base-catalyzed condensation product formed by the reaction of a bis(hydroxyphenyl)sulfone with formaldehyde to give a product known as a resole.
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申请公布号 |
US5460891(A) |
申请公布日期 |
1995.10.24 |
申请号 |
US19940286190 |
申请日期 |
1994.08.05 |
申请人 |
E. I. DU PONT DE NEMOURS AND COMPANY |
发明人 |
BUCK, ROBERT C.;PECHHOLD, ENGELBERT;MAY, DONALD D. |
分类号 |
C08G8/08;D06M15/41;D06M101/00;D06M101/16;D06M101/30;D06M101/34;(IPC1-7):D06M13/152 |
主分类号 |
C08G8/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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