发明名称 Substrates treated with bis(hydroxyphenyl)sulfone stain-resists
摘要 Polyamide fibrous substrates which resist staining by acid dyes and discoloration upon exposure to UV light, and processes for preparing the same which comprise applying, at pH 2 to 10, a base-catalyzed condensation product formed by the reaction of a bis(hydroxyphenyl)sulfone with formaldehyde to give a product known as a resole.
申请公布号 US5460891(A) 申请公布日期 1995.10.24
申请号 US19940286190 申请日期 1994.08.05
申请人 E. I. DU PONT DE NEMOURS AND COMPANY 发明人 BUCK, ROBERT C.;PECHHOLD, ENGELBERT;MAY, DONALD D.
分类号 C08G8/08;D06M15/41;D06M101/00;D06M101/16;D06M101/30;D06M101/34;(IPC1-7):D06M13/152 主分类号 C08G8/08
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