| 摘要 |
PURPOSE:To obtain a necessary pattern by a method wherein, after specified paste is printed on a substrate, a specified mask for shielding an electron beam is used, the part except the region where a pattern is formed is irradiated with an electron beam, and decomposed, and the paste on the decomposed part is eliminated. CONSTITUTION:A glass substrate 20 is coated with electron beam decomposition resin by using a plate coater. A metal mask for shielding an electron beam in which a hole having a specified pattern shape is formed is retained on the glass substrate 20 coated with the electron beam decomposition resin, and irradiated with an electron beam 23. By developing the paste on the glass substrate 20 irradiated with the electron beam, a die 24 having a specified shape is obtained. The die 24 is filled with paste 25 for forming a barrier for plasma display. The paste 25 is formed by kneading thick film pattern forming material and organic material having electron beam decomposition property. The die is retained on the glass substrate 20 coated with the electron beam decomposition resin, and the whole surface is irradiated with the electron beam 23. The die 24 is eliminated by baking, and a thick film pattern is obtained. |
