| 摘要 |
<p>PURPOSE:To reduce the contraction of film, to obtain a good resist profile, high resolution and a wide process latitude by incorporating at least one kind among alkali-soluble resin, a photo-acid generator and a specified compd. into the composition. CONSTITUTION:At least one kind among alkali-soluble resin, photo-acid generator and a compd. shown by formula I or II is incorporated into the composition. In the formulas I and II, each of R1 to R41 can be the same or different and is hydrogen atom, -X-Ra1 or -CN-OD0. In this case, the compd. shown by the formula I or II is obtained, for example, by allowing a polyhydroxy compd. as the compd. shown by the formula I or II where D0-D12=H to react with di-tert-butyl dicarbonate. Further, the three-component photosensitive composition consists essentially of a dissolution inhibitor, an alkali-soluble resin and a photo- acid generator.</p> |
