| 摘要 |
<p>PURPOSE:To provide a photosensitive resin compsn. which can be preferably used for a method to form a thick film pattern layer such as a color filter on a transparent substrate with high accuracy. CONSTITUTION:A photosensitive resin compsn. 2 containing a methacryl resin comprising copolymers of butylmethacrylate, methacrylic acid and butylacrylate, acryl monomers, photopolymn. initiator, and diluent is applied on a glass substrate 1, exposed to light and developed to form a pattern. Recesses consisting of the frame of this patterned compsn. layer and the exposed area of the glass substrate are filled with a color glass paste 4'. The paste is baked to form a color filter layer 4. By this method of using the photosensitive resin compsn., the pattern shape and the position of the color filter can be determined according to the pattern shape and position of the frame patterned by exposure and development. Thereby, the pattern shape and position of the color filter layer can be controlled with good accuracy to the optical limit.</p> |
