REMOVING SOLUTION FOR PHOTORESIST AND CIRCUIT PATTERN FORMING METHOD

摘要

PURPOSE:To safely and efficiently remove a side wall protecting film without corroding an aluminum-base circuit boad by using an aq. soln. contg. a bod specified ammonium or amine salt of org. carboxylic acid and a fluorine compd. CONSTITUTION:This removing soln. for a photoresist is an aq. soln. contg. an ammonium or amine salt of org. carboxylic acid' and a fluorine compd. or further contg. one or more kinds of org. solvents selected from among amides, lactones, nitriles, alcohols and esters. The ammonium or amine salt is represented by the formula [R<1>]m [COONHp(R<2>)q]n [where R<1> is 1-18C alkyl or aryl, R<2> is 1-4C alkyl, each of (m), (n) and (p) is an integer of 1-4, (q) is an integer of 0-3 and p+q=4].