| 摘要 |
PURPOSE:To improve the adhesive strength of a photoresist to the surface of a substrate by a simple means not requiring a novel device by using a photosensitive agent having a specified hydrolyzable group bonding to a silicon atom. CONSTITUTION:A compd. having a hydrolyzable group such as a silyl group is used as a photosensitive agent or a matrix polymer as a component of a photoresist 3. For example, a photosensitive agent having a hydrolyzable group bonding to a silicon atom such as a trimethoxysilyl group or a triethoxysilyl group is used. Since the photoresist 3 reacts directly with a substrate 1, adhesion is not affected by the amt. of a silane coupling agent. When a thin film of the photoresist 3 is dried after coating to remove the solvent, the hydrolyzable group reacts surely with a hydroxyl group to form a tight bond and this bond acts to enhance adhesive strength. |
