SINGLE SHEET HEAT TREATMENT SYSTEM

摘要

PURPOSE:To make a body to be processed possible CVD process and wet oxida tion process. CONSTITUTION:A wafer W placed on a mounting section 4 within a processing vessel is heated by means of a heating lamp 11. A processing gas introduction pipe 31 and a steam introduction pipe 41 are coupled with a shower head 21 at the introduction port 25. A channel 61 is formed within the processing vessel itself and a heat transmission medium heated by a heater 66 passes through the channel 61 thus heating the inner wall of the processing vessel up to the dew formation temperature or above. The supporting plate 22 for the shower head 21 and a diffuser 73 are heated up to the dew formation temperature or above by means of a heating element 73. Consequently, even if the steam is introduced through the shower head 21 into the processing vessel, no dew is formed on the inner wall of the processing chamber and the shower head 21.