Verfahren zum Entfernen von Photoresists auf Halbleitersubstraten.,申请号DE19873751333T-传众专利搜索

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发明名称	Verfahren zum Entfernen von Photoresists auf Halbleitersubstraten.
摘要
申请公布号	DE3751333(T2)	申请公布日期	1995.10.19
申请号	DE19873751333T	申请日期	1987.02.09
申请人	FUJITSU LTD., KAWASAKI, KANAGAWA, JP	发明人	FUJIMURA, SHUZO FUJITSU LIMITED PATENT DEPARTMENT, NAKAHARA-KU KAWASAKI-SHI KANAGAWA 211, JP;MOTOKI, YASUNARI FUJITSU LIMITED PATENT DEPARTMENT, NAKAHARA-KU KAWASAKI-SHI KANAGAWA 211, JP;KATO, YOSHIKAZU FUJITSU LIMITED PATENT DEPARTMENT, NAKAHARA-KU KAWASAKI-SHI KANAGAWA 211, JP
分类号	H01L21/30;G03F7/42;H01L21/027;H01L21/302;H01L21/306;H01L21/3065;(IPC1-7):G03F7/42	主分类号	H01L21/30
代理机构		代理人
主权项
地址

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