METHOD OF FORMING CONTACT HOLE BY DOUBLE SELECTIVE EXPOSURE OF PHOTOMASK

摘要

forming an insulation film on a semiconductor substrate, coating a photosensitive film on the insulation film, placing a double pattern mask on the film to execute a double select exposure; removing the photosensitive film exposed from a transparent film and a semi-transparent film of the double pattern mask; and dry-etching the photosensitive film exposed by the semi-transparent film and the insulation film exposed by the transparent film.