发明名称 X-ray mask structure, and x-ray exposure process.
摘要 The present invention provides an X-ray mask structure comprising an X-ray transmissive membrane, an X-ray absorber held on said X-ray transmissive membrane, and a holding frame that holds said X-ray transmissive membrane, wherein; said X-ray transmissive membrane comprises a layer of aluminum nitride; and said X-ray absorber comprises a nitride of heavy metal. a
申请公布号 EP0386786(B1) 申请公布日期 1995.10.18
申请号 EP19900104540 申请日期 1990.03.09
申请人 CANON KABUSHIKI KAISHA 发明人 IKEDA, TSUTOMU;SUGATA, MASAO;KATO, HIDEO
分类号 G03F1/00;G03F1/22 主分类号 G03F1/00
代理机构 代理人
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