发明名称 |
X-ray mask structure, and x-ray exposure process. |
摘要 |
The present invention provides an X-ray mask structure comprising an X-ray transmissive membrane, an X-ray absorber held on said X-ray transmissive membrane, and a holding frame that holds said X-ray transmissive membrane, wherein; said X-ray transmissive membrane comprises a layer of aluminum nitride; and said X-ray absorber comprises a nitride of heavy metal. a |
申请公布号 |
EP0386786(B1) |
申请公布日期 |
1995.10.18 |
申请号 |
EP19900104540 |
申请日期 |
1990.03.09 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
IKEDA, TSUTOMU;SUGATA, MASAO;KATO, HIDEO |
分类号 |
G03F1/00;G03F1/22 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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