发明名称 METHOD FOR FORMING TRANSPARENT ELECTRICALLY-CONDUCTIVE LAYER AND TRANSPARENT INSULATING LAYER ON GLASS
摘要 PURPOSE:To provide glass having a transparent electrically-conductive layer and a transparent insulating layer with excellent light transmission, peel resistance, heat resistance and surface strength. CONSTITUTION:A transparent glass plate is produced by a glass furnace. During a cooling process, a transparent electrically-conductive layer of tin oxide (SnOx) is formed on the surface of the glass by a CVD (chemical vapor-phase deposition) method in a metallizing furnace also used as an annealing furnace. After the formation of the transparent electrically-conductive layer, the tin oxide-deposited glass plate is annealed close to a normal temperature. A transparent insulating layer composed of a mixture of an alkoxysilane (Si(OR)q), an aluminum alkoxide (Al(OR)3) and aluminum oxide (Al2O3) is formed on the annealed transparent electrically-conductive layer of glass. After the formation of the transparent insulating layer, the glass plate is put in a curing layer and the transparent insulating layer is cured at 100-300 deg.C for about 30 minutes. After the formation of the transparent electrically-conductive layer, the glass plate is molded into a desired curved surface shape at a given softening temperature and subjected to the following process to produce the objective anti- fogging glass of curved surface.
申请公布号 JPH07267685(A) 申请公布日期 1995.10.17
申请号 JP19940076685 申请日期 1994.03.23
申请人 TATSUGUCHI KOGYO GLASS KK 发明人 TATSUKUCHI HIDEO
分类号 B60S1/02;C03C17/42;H05B3/84;(IPC1-7):C03C17/42 主分类号 B60S1/02
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