发明名称 |
Photosensitive composition comprising a polymer having a 4-hydroxybutyl(meth)acrylate monomer in a mixture with a diazo compound |
摘要 |
A photosensitive composition comprising a photosensitive material and a polymer, wherein the polymer comprises from 2 to 50 mol % of hydroxyalkyl (meth)acrylate units, of which the main component is units of a hydroxyalkyl (meth)acrylate of the following formula (I): <IMAGE> (I) wherein R1 is a hydrogen atom or a methyl group, and n is an integer of from 3 to 10.
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申请公布号 |
US5459010(A) |
申请公布日期 |
1995.10.17 |
申请号 |
US19940317773 |
申请日期 |
1994.10.04 |
申请人 |
MITSUBISHI CHEMICAL CORPORATION |
发明人 |
SHIMIZU, SHIGEKI;TSUJI, YOUICHIRO |
分类号 |
G03F7/033;(IPC1-7):G03F7/021 |
主分类号 |
G03F7/033 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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