发明名称 Photosensitive composition comprising a polymer having a 4-hydroxybutyl(meth)acrylate monomer in a mixture with a diazo compound
摘要 A photosensitive composition comprising a photosensitive material and a polymer, wherein the polymer comprises from 2 to 50 mol % of hydroxyalkyl (meth)acrylate units, of which the main component is units of a hydroxyalkyl (meth)acrylate of the following formula (I): <IMAGE> (I) wherein R1 is a hydrogen atom or a methyl group, and n is an integer of from 3 to 10.
申请公布号 US5459010(A) 申请公布日期 1995.10.17
申请号 US19940317773 申请日期 1994.10.04
申请人 MITSUBISHI CHEMICAL CORPORATION 发明人 SHIMIZU, SHIGEKI;TSUJI, YOUICHIRO
分类号 G03F7/033;(IPC1-7):G03F7/021 主分类号 G03F7/033
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