发明名称 Semiconductor memory device having memory cells with enhanced capacitor capacity
摘要 A semiconductor memory device includes a dielectric layer formed on a conductive thin film layer constituting a shield electrode for effecting element separation in a field area, the dielectric layer connected to a dielectric layer of a capacitor with a lower electrode having part thereof opposite to part of the shield electrode through the dielectric layer, and has an increase in electrode area of a memory cell to be able to attain the high level of integration.
申请公布号 US5459685(A) 申请公布日期 1995.10.17
申请号 US19940218947 申请日期 1994.03.29
申请人 NIPPON STEEL CORPORATION 发明人 ANZAI, KENJI;WADA, TOSHIO
分类号 H01L27/04;H01L21/822;H01L21/8242;H01L27/10;H01L27/108;(IPC1-7):H01G4/06;H01L29/78 主分类号 H01L27/04
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