LASER BEAM ANNEALING DEVICE

摘要

PURPOSE:To restrain the unevenness at a joint part in the scanning range of laser beam irradiation and to shorten the time needed to recrystallization, in a laser beam annealing device for executing the recrystallization of silicon thin film by the irradiation of the laser beam. CONSTITUTION:Energy of the laser beam 2 from a laser oscillator 1 is changed with an attenuator 3 and the uniformity of the energy is improved with a homogenizer 4. After deciding the energy of the laser beam 2 through a lens system 5, the laser beam is transmitted to a beam dividing system 6 and divided into plural laser beams 2a, 2b and irradiates the silicon film 8 on a substrate 7 shifted toward two dimensions.