发明名称 |
LIQUID CRYSTAL MASK TYPE PATTERN TRANSFER DEVICE |
摘要 |
PURPOSE:To make it possible to transfer continuous arbitrary patterns to a work by providing the above device with a liquid crystal mask which is finely adjustable within a plane nearly parallel with a screen. CONSTITUTION:A laser beam 1 is expanded in beam diameter by a beam expander 3 and the entire surface of the liquid crystal mask 4 is irradiated with this beam at one time. The laser beam having the patterned polarization direction to perform marking by passing the liquid crystal mask 4 is reflected by a polarization beam splitter 5 and is cast through an imaging lens 6 to a photosensitive resin 7. The liquid crystal mask 4 is provided with an X-Z stage 8. The liquid crystal mask 4 is finely adjustable in lateral and vertical directions within the plane parallel with its screen. A pixel which is one on the liquid crystal mask 4 is transformed in the form of the plural pixels shifted from each other to the photosensitive resin 7 by finely adjusting the liquid crystal mask 4 at every irradiation of the liquid crystal mask 4 with the laser for the specified period of time. The character 'A' formed in such a manner turns to the character 'A' superposed with the four patterns by the fine adjustment of the mask 4 in the lateral and vertical directions. |
申请公布号 |
JPH07266065(A) |
申请公布日期 |
1995.10.17 |
申请号 |
JP19940058505 |
申请日期 |
1994.03.29 |
申请人 |
HITACHI LTD |
发明人 |
TAKEHISA KIWAMU;KUWABARA KOJI |
分类号 |
G02F1/13;B23K26/00;B23K26/04;B23K26/06;G03B27/32 |
主分类号 |
G02F1/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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