| 摘要 |
PURPOSE:To protect a semiconductor device having a photoelectric conversion function by coating material which contains polysiloxane and/or silylated vinyl polymer represented by general formulas respectively. CONSTITUTION:A semiconductor device is protected by coating material which contains hydrolysate of a kind of alkoxysilane represented by a formula, Rn-Si (OR<1>)4-n (in formula, R denotes hydrogen atom or alkyl group where C ranges from 1 to 12 in number, R<1> is hydrogen atom or alkyl group where (2 ranges from 1 to 6 in number, and n is 0, 1, 2, or 3) or polysiloxane formed of the partial condensation product of the above hydrolysate and/or silylated vinyl polymer represented by a formula, -Si(OR<1>)3-m(R<1>)m (in formula, m is 0, 1, or 2). Therefore, the coating material of this constitution is excellent in transparency, resistance to scratching, acid, weathering, and staining, and insulating properties and capable of protecting semiconductor devices such as a solar cell, an infrared detector, a photodiode, and a color sensor. |
