FORMATION OF INTEGRATED LIGHTGUIDE STRUCTURE USING DOUBLE MASKING AND ATTACHED MASK-PATTERN PAIR

摘要

PURPOSE: To provide a forming method for easily arraying a waveguide structure which has a symmetrical component structure and an asymmetrical component structure like an asymmetrical X connection by using double making technology. CONSTITUTION: The entire waveguide structure is formed of two different mask patterns P1 and P2 which are mounted successively at mutually overlapping positions. Those two mask patterns are mutually arrayed in array directions parallel (Z axis) and at right angles (X axis) to the axis of symmetry of the symmetrical component structure. The respective mask patterns consist of 1st asymmetrical component patterns 32, 35 and 2nd asymmetrical component patterns 31 and 33, and 34 and 36. The 1st component patterns 32, 35 form separate parts of the asymmetrical component structure respectively. The 2nd component patterns 31 and 33, and 34 and 35 form mirror images mutually and consist of component shapes 33 and 36 which depend upon the predetermined array accuracy W1 in the array direction at right angles (X axis) to the of symmetry axis.