| 摘要 |
PURPOSE:To provide a photosensitive composition having higher sensitivity and improved mechanical strength and chemical resistance by using as its constituent a microgel consisting of a polymer contg. groups each of which has a protecting group that is eliminable with acid. CONSTITUTION:This composition contains a microgel consisting of a compound that generates an acid by the irradiation with actinic ray and a polymer contg. groups, each of which has a protecting group that is eliminable with the acid. Then, an image forming material that has on a substrate at least one layer consisting of this composition is irradiated with actinic rays and then subjected to heat treatment and thereafter, the resulting material is developed. This microgel has an ununiform structure in the photosensitive composition layer. A microgel, that has 0.005 to 1mu particle size and is insoluble in solvents because of that the constituent polymer of the particles takes a crosslinked structure, and also dispersible in water or organic solvents and further visually almost transparent at the time of dispersing the microgel together with a binder in a solvent and coating a film base with the resulting dispersion to form a film on it. This microgel is produced by using the emulsion polymerization. |
