发明名称 |
GLASS FOR SUPPORTING BODY OF X-RAY MASK OR X-RAY MASK FORMING MATERIAL, X-RAY MASK FORMING MATERIAL, AND X-RAY MASK |
摘要 |
<p>PURPOSE:To join a glass supporting body to the silicon substrate of an X-ray mask forming material or X-ray mask by anode coupling at a specific temperature or lower by using such a kind of glass that has a volume resistivity which falls within a specific range at a specific temperature for the glass supporting body. CONSTITUTION:An X-ray mask forming material 10 is formed by joining a silicon substrate 12 having an X-ray transmitting film 11 to a glass supporting body 13 by anode coupling. The glass supporting body 13 has a volume resistivity of 1X10<13> to 1X10<5>OMEGA.cm at 20 deg.C. To be more concrete, the supporting body is composed of aluminosilicate glass containing crystals of beta-eucryptite or beta-quartz or both of them in the form of a solid solution. In addition, the coefficient of thermal expansion of the glass is adjusted so that it can become substantially equal to that of silicon in the anode coupling temperature region. Therefore, the glass supporting body can be anode-coupled to the substrate 12 at 200 deg.C or lower.</p> |
申请公布号 |
JPH07263318(A) |
申请公布日期 |
1995.10.13 |
申请号 |
JP19940055742 |
申请日期 |
1994.03.25 |
申请人 |
HOYA CORP |
发明人 |
SHIYOUKI TSUTOMU;OKUBO AKIRA;YAMAGUCHI YOICHI |
分类号 |
C03C10/12;C03C10/14;G03F1/22;H01L21/027;(IPC1-7):H01L21/027;G03F1/16 |
主分类号 |
C03C10/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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