THIN FILM MATERIAL FOR FORMING DAMPING PHASE SHIFT MASK AND PREPARATION THEREOF

摘要

PURPOSE: To provide a light-transmitting attenuation phase shift mask. CONSTITUTION: A phase shift layer 18 which attenuates the energy of specified wavelength is formed in a phase shift mask. This method includes a step to prepare a substrate which is transparent for specified wavelength, a step to prepare a deposition target 20 containing silicon, and a step to deposit a layer containing silicon and nitrogen on a substrate from the target 20 by using a deposition process in a gas atmosphere containing a reactive nitrogen component.