POSITIVE TYPE PHOTORESIST COMPOSITION

摘要

PURPOSE:To obtain a positive type photoresist generating no foreign matter with the lapse of time and ensuring a low variation of sensitivity to the photosensitive agent content. CONSTITUTION:This photoresist compsn. contains an alkali-soluble resin, a 1,2-naphtoquinonediazido photosensitive agent and a simple solvent having 140-160 deg.C b.p. and gives a positive type photoresist having satisfactory shelf stability and easily controllable sensitivity because it generates no foreign matter with the lapse of time and ensures a low variation of sensitivity to the photosensitive agent content.