| 摘要 |
PURPOSE:To provide an orthogonality measuring method of a stage device in which the load of a stage orthogonality measuring operation is reduced and whose orthogonality can be controlled by a periodic orthogonality measurement. CONSTITUTION:A board, for measurement, in which four patterns P1 to P4 for measurement have been formed along the X'-axis and the Y'-axis at right angles on an arrangement coordinate system is prepared. By using the patterns P3, P4, the X'-axis is positioned on the X-axis of the movement coordinate system of a stage. The patterns P1, P3, P4 are detected, and the orthogonality beta' (0 deg.) of the arrangement coordinate system with reference to the movement coordinate system at a rotation of 0 deg. is found. The board for measurement is turned by 90 deg., and the Y'-axis is positioned on the X-axis by using the patterns P1, P3. The patterns P1, P2, P3 are detected, and the orthogonality beta' (90 deg.) at a rotation of 90' is found. The orthogonality alpha of the movement coordinate system is found on both orthogonalities. |
