| 摘要 |
PURPOSE:To provide a developing device which can efficiently perform developing treatment with a less amount of developing solution and can uniformly develop the surface of a substrate to be treated even when the substrate has a large size. CONSTITUTION:An annular member 5a which forms an annular dam surrounding a substrate 3 to be treated is provided in a treatment chamber 2. The member 5a has a plurality of developing solution supplying ports 5b which are arranged to surround a susceptor 4 and form developing solution flows toward the substrate 3 almost in parallel with the substrate 3. On the member 5a, facing sections 5c which are faced to the ports 5b at intervals are formed and a ring- like member 5d which directs the developing solution flows downward is mounted. |
