Formation of very heat-stable relief patterns.

摘要

Very heat-stable relief patterns can be produced in a simple and inexpensive way from polybenzoxazole precursors without them containing polymerisable groups or without photoactive components being present if soluble hydroxypolyamides in the form of a layer or sheet are applied to a substrate and are exposed by means of a UV excimer laser having a power density of > 10<5> W/cm<2> per pulse through a mask, then developed with an aqueous alkaline developer and subsequently heat-treated.