发明名称 |
Method of manufacturing photo-mask and photo-mask manufactured thereby |
摘要 |
A photo-mask and a method of manufacturing a photo-mask, which includes the steps of applying a resist film onto a substrate of quartz, glass and the like, subjecting the resist film to light exposure and development to form a fine resist pattern, etching the mask substrate covered by the fine resist pattern, causing a non-light transmitting thin film of Cr, Ta, etc. to adhere thereon by vapor deposition, sputtering and the like, and removing the thin film on the resist pattern together with the resist film, thereby to form the photo-mask.
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申请公布号 |
US5457006(A) |
申请公布日期 |
1995.10.10 |
申请号 |
US19910684680 |
申请日期 |
1991.03.29 |
申请人 |
SHARP KABUSHIKI KAISHA |
发明人 |
HIROKANE, JUNJI;KATAYAMA, HIROYUKI;TAKAHASHI, AKIRA;INUI, TETSUYA;OHTA, KENJI;WASHO, JUNICHI;MIYAKE, TOMOYUKI;VAN, KAZUO;MIEDA, MICHINOBU |
分类号 |
G03F1/00;G03F1/08;G03F1/14;G03F1/54;G03F1/68;G11B7/26;(IPC1-7):G03C5/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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