发明名称 Floating gate FET with hydrogen barrier shield
摘要 A nonvolatile storage element of a single-layer gate type structure is arranged so that a floating gate is formed of a conductive layer which partly overlaps with a control gate, formed of a diffused layer, and is provided with a barrier layer covering a part of or the whole surface of the floating gate. Nonvolatile storage elements characterized as such are used for redundancy control of defects or change of functions.
申请公布号 US5457335(A) 申请公布日期 1995.10.10
申请号 US19910727409 申请日期 1991.07.09
申请人 HITACHI, LTD.;HITACHI VLSI ENGINEERING CORP. 发明人 KURODA, KENICHI;TAKEDA, TOSHIFUMI;MORIUCHI, HISAHIRO;SHIRAI, MASAKI;SAKAGUCHI, JIROH;MATSUO, AKINORI;YOSHIDA, SHOJI
分类号 H01L21/8247;H01L27/10;H01L27/105;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L27/115 主分类号 H01L21/8247
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