发明名称 |
Conditioner for a polishing pad and method therefor |
摘要 |
An axially rotating circular polishing pad is conditioned by a rotating end effector that has an abrasion disc in contact with a polishing surface of the pad. The end effector moves along a radius of the polishing pad surface at a velocity that varies to compensate for locations on the polishing pad surface having linear velocities that are directly related to their respective radii. A desired contact force is maintained between the end effector and the polishing pad surface.
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申请公布号 |
US5456627(A) |
申请公布日期 |
1995.10.10 |
申请号 |
US19930148906 |
申请日期 |
1993.12.20 |
申请人 |
WESTECH SYSTEMS, INC. |
发明人 |
JACKSON, PAUL D.;SCHULTZ, STEPHEN C.;SANFORD, JAMES E.;ONG, GLEN;RICE, RICHARD B.;MODI, PARAG S.;BACA, JOHN G. |
分类号 |
B24B37/04;B24B49/18;B24B53/007;(IPC1-7):B24B49/18;B24B53/02 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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