Herstellung eines Glastiegels aus Quarz zur Verwendung in der Herstellung von Einkristall-Silizium.
摘要
<p>A quartz glass crucible for use in a process for pulling a single crystal silicon and having an outer layer (3) and an inner layer (4). The outer layer (3) contains less than 0.3 ppm each of Na, K and Li and more than 5 ppm of Al. The outer layer (3) further contains bubbles to present an opaque appearance. The inner layer (4) is made by melting powders of high purity non-crystalline synthetic silica and contains less then 200 ppm of OH group. There is also disclosed a method for producing the crucible. <IMAGE></p>