发明名称 |
Resist composition for deep ultraviolet light. |
摘要 |
A resist composition for deep ultraviolet light comprising (a) one of the following resin components (i)-(iii): (i) a resin which becomes alkali-soluble by eliminating protective groups by the action of an acid, (ii) a combination of an alkali-soluble resin and a dissolution-inhibiting compound, and (iii) a combination of an alkali-soluble resin and a crosslinkable compound, (b) an acid generater, (c) a special anthracene derivative, and (d) a solvent, is suitable for forming a pattern using deep ultraviolet light, KrF excimer laser light, etc., on a highly reflective substrate having level differences due to absorption of undesirable reflected deep ultraviolet light. |
申请公布号 |
EP0675410(A1) |
申请公布日期 |
1995.10.04 |
申请号 |
EP19950301946 |
申请日期 |
1995.03.23 |
申请人 |
WAKO PURE CHEMICAL INDUSTRIES LTD;MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
URANO, FUMIYOSHI, C/O TOKYO KENKYUSHO;YASUDA, TAKANORI, C/O TOKYO KENKYUSHO;KATSUYAMA, AKIKO;YAMASHITA, KAZUHIRO |
分类号 |
G03F7/004;G03F7/039;G03F7/09 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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