Method to reduce emitter-base leakage current in bipolar transistors

摘要

Generally, and in one form of the invention, a method is disclosed for reducing base-to-emitter leakage in a bipolar transistor having an active region 22 bounded by an isolation implant boundary 24, said method comprising arranging an emitter contact 26 and a base contact 36 such that at a crossing of the contacts over the implant boundary, a leakage current between the contacts along the boundary is limited by a necessity to transit the thickness of a layer of material, and whereby said transistor exhibits improved gain, noise performance, and reliability.