| 摘要 |
PURPOSE:To obviate generation of dust generation in ink wiping cloth etc. by forming a photosensitive resist of prescribed patterns on an inorg. film and etching away the inorg. film of the parts exposed in correspondence to the prescribed patterns. CONSTITUTION:The glass surface in the apertures of the resist is etched but an etchant does not arrive at the surface of an etching mask film 2 and, therefore, the defective erosion by the glass etchant in the pinhole part of the etching mask film 2 is not generated when the glass is etched in the state of allowing the resist film 3 to remain on the inorg. film 2 for the etching mask. As a result, the fine etching of deep grooves of >=5mum is made possible while smooth protecting surfaces are maintained. The sharp angled edge parts of the glass are eroded by an isotropic etching property of wet etching, etc., and are worked to a glass intaglio printing 4 of a shape having a radius of curvature when the substrate 1 having the exposed glass surface is again etched in a short period of time. |
