发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To provide a photosensitive resin compsn. showing excellent balance in various properties such as sensitivity, resolution, heat resistance, profile, and focus depth. CONSTITUTION:This photosensitive resin compsn. contains a photosensitive agent expressed by formula and a novolac resin. In formula, R1, R2, R8 and R9 are hydrogen, alkyl groups, or the like, R3, R4 and R7 are hydrogen or 1,2- naphthoquinone diazide sulfonyl groups, and R5 and R6 are cycloalkyl groups.
申请公布号 JPH07253664(A) 申请公布日期 1995.10.03
申请号 JP19940043711 申请日期 1994.03.15
申请人 SUMITOMO CHEM CO LTD 发明人 OZAKI HARUKI;TOMIOKA ATSUSHI;KAMIYA YASUNORI
分类号 G03F7/022;G03F7/023;H01L21/027;(IPC1-7):G03F7/022 主分类号 G03F7/022
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