发明名称 Photovoltaic device having a semiconductor grade silicon layer formed on a metallurgical grade substrate
摘要 The disclosure relates to a semiconductor device comprising silicon having a substrate composed of low grade silicon, a silicon layer whose silicon purity is higher than that of the low grade silicon formed on the substrate and an electrode formed on the silicon layer. In the device, the low grade silicon may be selected from metallurgical grade silicon and silicon whose purity is less than 99.99%, and the silicon layer may be over 99.999% purity or semiconductor grade.
申请公布号 US5455430(A) 申请公布日期 1995.10.03
申请号 US19920922579 申请日期 1992.07.30
申请人 SANYO ELECTRIC CO., LTD. 发明人 NOGUCHI, SHIGERU;IWATA, HIROSHI;SANO, KEIICHI
分类号 H01L29/04;H01L31/072;H01L31/18;H01L31/20;(IPC1-7):H01L29/04;H01L27/14;H01L31/00 主分类号 H01L29/04
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