METHOD OF COATING PHOTORESIST

摘要

The method improves the productivity by using the 80% photo resist material which is located on the vessel by high speed rotation of main spinner. The method includes the 1st means which photo resist material is coated under the high pressure in the main spinner(7), and the 2nd means which EBR(edge bead removal) processing in the extra spinner(16). The main spinner pressure is the 1.5 or 5 pressure. The EBR processing of extra spinner(16) is executed under atmospheric pressure.