| 发明名称 |
METHOD OF MANUFACTURING EXPOSURE APPARATUS |
| 摘要 |
The method concurrently improves the focus degree between upper part and lower part by variation of focus point. The device includes a first conduction layer(7), a first insulation layer(8), a second insulation layer(9) on the silicon board(6), and the light development layer pattern forming means between upper part(11) and lower part(12).
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| 申请公布号 |
KR950011169(B1) |
申请公布日期 |
1995.09.28 |
| 申请号 |
KR19920026706 |
申请日期 |
1992.12.30 |
| 申请人 |
HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. |
发明人 |
KWON, WON - TAEK;LEE, DU - HUI;KIL, MYONG - KUN;KU, YONG - MO;HYON, IL - SON |
| 分类号 |
G03F7/207;(IPC1-7):G03F7/207 |
主分类号 |
G03F7/207 |
| 代理机构 |
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| 主权项 |
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| 地址 |
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