APPARATUS OF EXPOSURING HOLOGRAPHICS

摘要

The holographic interference exposing device has a main source(1) for generating a short wavelength laser beam, a beam splitter(4) for splitting the laser beam into two laser beams to cause a difference in the light path of the laser beam and to form a pattern in a semiconductor substrate having photosensitive materials on the surface of it, and a means for guiding the laser beam to the beam splitter, and redirecting the two laser beams on the surface of the semiconductor substrate. The device comprises an auxiliary laser source for generating a long wavelength laser beam, and a chopper for making the light path of the long wavelength laser beam combine with that of the short wavelength laser beam so that a predetermined degree of alignment of the semiconductor substrate with respect to the short wavelength laser beam can be achieved. The long wavelength laser beam is of sufficiently long wavelength so that it has no effect upon the photosensitive materials.