首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
METHOD FOR CHEMICODYNAMIC TREATMENT OF GALLIUM ARSENIDE WAFERS
摘要
申请公布号
RU2045108(C1)
申请公布日期
1995.09.27
申请号
SU19915008191
申请日期
1991.07.01
申请人
NAUCHNO-ISSLEDOVATELSKIJ INSTITUT MOLEKULYARNOJ ELEKTRONIKI
发明人
GARIPOV VASILIJ G;SHMELEV NIKOLAJ I;GARANIN VIKTOR P
分类号
H01L21/306;(IPC1-7):H01L21/306
主分类号
H01L21/306
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Blood pressure measuring apparatus
Stop pin apparatus
Fibre-reactive 1:1 chromium complex azo or azomethine dyes having a bidentate chelating group and a monofunctional neutral ligand
Support for an antenna of the azimuth-elevation type
Window assemblies
Method of applying a coating of viscous materials
Method of hydrophobing silica
Bed movable to plural positions
Circuit configuration for temperature monitoring of power switching transistors integrated in a semiconductor circuit
Substituted cyclohexene derivatives as HMG-CoA reductase inhibitors
DISCHARGE TUBE LIGHTING DEVICE
DRAWER TYPE CIRCUIT BREAKER
METHOD AND DEVICE FOR FORMING COMPLEX STRUCTURE
HYDROPHILIC, POROUS MEMBRANE AND ITS MANUFACTURING METHOD
DETERMINATION OF HUMAN CYTOMEGALOVIRUS
PRODUCTION OF ESCHERICHIA COLI RIBONUCLEASE H BY RECOMBINANT DNA TECHNIQUE
PRODUCTION OF 1, 3-PROPANE DIOL BY FERMENTING MEANS
BATTERY PACK BOX
PHOTOSENSITIVE COMPOSITION
AUTOMATIC FOCUSING CONTROLLER