DHOTOMASK FOR DECTATING EXACT FOCUS OF EXPOSURE APPARATUS

摘要

The device makes a dot array a good development layer pattern, and exactly detects a stepper focus by patternning a dot array on a scribe line of photo mask with a critical dimension (CD) for optimal focus maximum. The device comprises a photo mask, a reticle, a light concentrator, a wafer support, a focus and two position adjustment devices. The device includes a die which is formed by a pattern, a scribe line which is formed between dies, and a dot array pattern on a scribe line. The dot array pattern is formed by different methods.