| 摘要 |
PURPOSE:To efficiently form a high-resolution pattern by incorporating a thermosetting resin and an iodine compound generating hydrogen iodide when radiated with active chemical rays as an acid precursor. CONSTITUTION:A thermosetting resin and an iodine compound generating hydrogen iodine when radiated with active chemical rays are contained as an acid precursor. The developing period about 5-10 times the period in which the paint film of a nonradiation section is dissolved, is required, thus the dissolving speed of the paint film of the nonradiation section is desirous to be made larger. The iodide compound having the hydroxyl group in the molecule is excellent in the developing property in an alkaline aqueous solution, and it is particularly effective as the acid precursor of a pattern forming material. 2,4,6-triiodo phenol, 6-iodo-2-picoline-5-ol, 5,7-diiodo-8-hydroxyquinoline, 2-iodobenzyl alcohol, 2- iodoethanol, or 4-iodo-2-methyl phenol can be used as the acid precursor. |
