| 摘要 |
PURPOSE:To manufacture a half-tone phase shift mask arranged with auxiliary patterns for reducing sub-peaks, solving the problem of the suppression of the phase shift effect caused by the auxiliary patterns, dissolving troublesome sub- peaks, and having a good phase shift mask effect. CONSTITUTION:This phase shift mask is provided with a light transmission section 1 and a half-shading section 2, and the light transmission section 1 and the half-shading section 2 transmit light in phases different from each other. Auxiliary patterns 31-34 reducing sub-peaks are arranged around one of the light transmission section 1 and the half-shading section 2 providing a main pattern. The positions of the auxiliary patterns 31-34 are calculated and designed to reduce sub-peaks without suppressing the phase shift effect. The auxiliary patterns 31-34 are arranged on the side further apart from the occurrence positions of sub-peaks than the main pattern. |
