| 摘要 |
PURPOSE:To provide a technique of exposing a phase shifting mask, which can be formed by an easy process technique, such as a conventional technique of manufacturing a photomask, and is made also a detection of a defect possible by a conventional technique. CONSTITUTION:1. At least one sheet of a mask (a) is a mask, which is provided with light-shielding parts 15 and light-transmitting parts 16, one sheet of the other mask (b) is a mask, which is provided with phase shifter parts 19 for shifting the phase of transmitted light, and a material to be exposed is exposed with lights transmitted both of both masks. 2. An aligner uses the masks in the above 1. 3. A phase shifting mask is formed by bonding together the mask, which is provided with the parts 15 and the parts 16, and the mask, which is provided with the parts 19 for shifting the phase of the transmitted light. |
